Maskless Lithography Encrypts And Secures Chips

Leti research institute of CEA Tech and Mapper Lithography, provider of maskless lithography equipment, have developed what they describe as a low-cost cyber-security breakthrough that encrypts individual chips with a code. The non-falsifiable code is generated with direct multi-beam writing in a process that fits in a conventional CMOS flow with an extra level of lithography and without photomasks. Throughput on Mapper’s FLX-1200 tool is compatible with optical systems. The markets for these chips include data security, traceability, and combatting imports of counterfeit chips.

 

The two companies presented a paper on the breakthrough, “Process development of a maskless N40 via level for security application with multi-beam lithography”, at SPIE Advanced Lithography 2018 in San Jose, Calif. The paper demonstrates a via patterning integration that is compliant with standard CMOS 40nm process flow.

SENSORS MIDWEST

Sensors Midwest Hits Rosemont, IL October 16-17!

Sensors Midwest, the industry's largest event focusing on sensors, design, and IIoT in the Midwest region, is scheduled for October 16-17 at the Donald E. Stephens Convention Center in Rosemont, IL. Co-located with STMA, the event draws over 1,000 engineers and engineering professionals that are looking for access to the latest sensor advancements and will provide an opportunity to connect with the area's greatest technology leaders and suppliers.

 

The maskless lithography system, based on massively parallel electron-beam writing capability developed by Mapper, is designed for high-volume specialty chips and low-volume advanced logic. Leti and Mapper are demonstrating the breakthrough for their customers at Leti’s facility in Grenoble. For more insights, visit Mapper and Leti.