The Sputter Process Monitor SPM 220 and High-Pressure Analyzer HPA 220 from Pfeiffer Vacuum Inc., Nashua, NH, are gas analysis systems that monitor and document vacuum process, such as coating architectural glass or thin-film solar cells, and are available in mass ranges of 1–100 amu and 1–200 amu. The HPA 200 is also available from 1–300 amu. The SPM 220 has a specially developed ion source that enables a direct connection between the analyzer and the process chamber, allowing you to monitor the vacuum conditions of sputter processes. The HPM 220 has 3 different gas inlet valves, depending on application conditions, and provides gas analysis from high vacuum to 50 mbar.
Pfeiffer Vacuum Inc.