Semiconductor Metrology System from Rudolph
Rudolph Technologies Inc.
July 22, 2009
The S3000S from Rudolph Technologies Inc., Flanders, NJ, is used for inline process control of advanced diffusion and fab-wide thin-film applications. The system enables simultaneous measurement with multi-wavelength, multi-angle focus beam ellipsometry (FBE) and deep UV reflectometry (DUVR) for reduced measurement time and increased throughput. The system allows you to characterize complex films and provide precise control of advanced processes. An optional MAControl module provides 1-step, uniform, nondestructive removal of the molecular airborne contamination layer on thin films to allow more accurate measurement of the true thin-film thickness.
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